کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
220046 | 463313 | 2010 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Nickel sulfur thin films deposited by ECALE: Electrochemical, XPS and AFM characterization
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Nickel sulfur thin films deposited by ECALE: Electrochemical, XPS and AFM characterization Nickel sulfur thin films deposited by ECALE: Electrochemical, XPS and AFM characterization](/preview/png/220046.png)
چکیده انگلیسی
This paper reports on a study of the electrodeposition of nickel sulfide thin films on Ag(1 1 1) by the Electrochemical Atomic Layer Epitaxy (ECALE) technique. The multilayer growth of nickel sulfide has been studied by cyclic and stripping voltammetry. The composition of the films was studied by XPS analysis and the morphology was studied by Atomic Force Microscopy (AFM). The phenomenological observation of the hydrogen evolution reaction (HER) suggests the presence of electrocatalytic properties of the thin films obtained.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Electroanalytical Chemistry - Volume 638, Issue 1, 5 January 2010, Pages 15–20
Journal: Journal of Electroanalytical Chemistry - Volume 638, Issue 1, 5 January 2010, Pages 15–20
نویسندگان
F. Loglio, M. Innocenti, A. Jarek, S. Caporali, I. Pasquini, M.L. Foresti,