Ternary CoPtP electrodeposition process: Structural and magnetic properties of the deposits

Ternary CoPtP electrodeposition process in an acid bath has been studied and CoPtP films have been electrodeposited over silicon/seed-layer. The influence of bath composition, temperature and pH on ternary electrodeposition process, deposits composition, structure and magnetic properties has been studied. Homogeneous and bright ternary deposits have been obtained with magnetic properties from soft magnetic to hard magnetic. A clear enlargement of films coercivity was obtained when platinum percentage in the deposits was around 30–40 wt%. Susceptibility of the CoPtP films has increased after annealing of the samples. Deposits show hexagonal structure with gradual Pt incorporation in the Co crystalline lattice.