The role of SiO2 barrier layers in determining the structure and photocatalytic activity of TiO2 films deposited on stainless steel

TiO2 thin films were deposited using two different precursor systems, and their photocatalytic activities studied in the context of the feasibility of self-cleaning added value steel products. SiO2 layers deposited using flame-assisted CVD were investigated as possible barrier layers to prevent diffusion of substrate components in to the TiO2 films. The films were characterized by X-ray photoelectron spectroscopy (XPS), sputtered neutral mass spectrometry (SNMS), Raman spectroscopy and scanning electron microscopy (SEM). Photo-activity was characterised by the UV-induced destruction of stearic acid layers.On bare steel growth using titanium tetraisopropoxide yielded anatase, while growth with titanium tetrachloride (with ethyl acetate) yielded rutile. In contrast, on silica coated steels both precursor systems yielded anatase exclusively.The diffusion of components originating from the steel substrates was shown to have a deleterious effect on the photoactivities of the TiO2 thin films, with this effect being more influential at higher deposition temperatures. However, the presence of the SiO2 barrier layers significantly reduced ion diffusion into the TiO2 film and consequently also improved the photocatalytic activity of the samples. While the SiO2 coated samples gave rise to anatase growth, there is evidence that the thickness of the SiO2 coating has a direct effect on TiO2 morphology.

This paper describes the deposition of TiO2 thin films using two different precursor systems, and their photocatalytic activities studied in the context of the feasibility of self-cleaning added value steel products. SiO2 layers deposited using flame-assisted CVD were investigated as possible barrier layers to prevent diffusion of substrate components in to the TiO2 films. Figure optionsDownload as PowerPoint slide