The possibility of reducing the reflectance and improving the tribological behavior of Si wafer by UNSM technique

The possibility of reducing the reflectance and improving the tribological behavior of Si wafer by UNSM technique

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Tribology International - Volume 105, January 2017, Pages 175-184

Auezhan Amanov, Hyun-Goo Kwon, Young-Sik Pyun,