کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5145315 | 1497341 | 2017 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Photoelectrochemical characteristics of CuO films with different electrodeposition time
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Photoelectrochemical characteristics of CuO films with different electrodeposition time Photoelectrochemical characteristics of CuO films with different electrodeposition time](/preview/png/5145315.png)
چکیده انگلیسی
This paper explores the effect of electrodeposition time on microstructure, optical, and photoelectrochemical properties of CuO films. CuO films were electrochemically deposited on tin-doped indium oxide (ITO) substrates using a Cu2O electrodeposition method followed by annealing at 550 °C for 2 h. The electrochemical deposition was carried out at different times (300, 600, 1200, and 1800 s) utilizing a copper sulfate pentahydrate and lactic acid solution. X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) were used to perform phase and microstructure analysis. Photoluminescence (PL) studies confirmed an increase in emission intensities with increasing deposition time. In addition, a significant change was observed in photoelectrochemical properties of the film by varying the deposition time. The film deposited for 600 s showed a high photocurrent density of â0.55 mA cmâ2 at â0.5 V. Moreover, a lowest resistance from electrochemical impedance spectroscopy (EIS) was recorded for the films electrochemically deposited for 600 s.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Hydrogen Energy - Volume 42, Issue 36, 7 September 2017, Pages 23268-23275
Journal: International Journal of Hydrogen Energy - Volume 42, Issue 36, 7 September 2017, Pages 23268-23275
نویسندگان
Asad Mahmood, Fatih Tezcan, Gulfeza KardaÅ,