Mechanisms of ordering in block copolymer sub-monolayer films upon selective solvent annealing

The solvent annealing induced two-dimensional ordering in poly(styrene-ethylene/butylenes-styrene) (SEBS) triblock copolymer sub-monolayer films with a thickness of 16 nm equaling half of the bulk domain thickness l0 was investigated by time-resolved ex-situ atomic force microscopy (AFM). Cyclohexane, a selective solvent for majority poly(ethylene/butylenes) block was used. The detailed pathway information on the ordering of highly regular hexagonal spheres was obtained by repeatedly taking images of the same marked area on the sample surface after ex-situ annealing treatments. Two different ordering mechanisms were observed under two different solvent annealing conditions: 1) under a well-sealed environment with a slow cyclohexane evaporation rate, poorly-ordered short cylinders first break into spheres, then the evolution of spherical phase takes place to gradually improve the orderliness of spheres, and finally well-ordered hexagonal spheres are formed; 2) under a poorly-sealed environment with a fast cyclohexane evaporation rate, “holes” and “islands” are instantaneously formed on the sample surface first, and then the surface gradually get even annihilating hole and island areas. Within the hole areas, the transition from short cylinders to hexagonal spheres takes place via a not well-defined microphase separation structure, while in the island areas, the transitions between cylinders and spheres take place to improve the orderliness of cylinders, and finally the enough-ordered cylinders transform into hex-spheres.