کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5187947 | 1381141 | 2005 | 12 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Thermal chemical vapor deposition of fluorocarbon polymer thin films in a hot filament reactor
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی آلی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Formation of fluorocarbon polymer films with a linear (CF2-CF2)n molecular structure similar to polytetrafluoroethylene, PTFE is described by a hot filament chemical vapor deposition method. Growth process is analyzed by infrared absorption and C(1s), O(1s) and F(1s) core level electron spectroscopy of films deposited at â5 and +70 °C. Absorption doublet at 1220 and 1160 cmâ1 assigned to C-F2 asymmetric and symmetric stretches, rock at 518 cmâ1 and wag at 637 cmâ1 indicate formation of linearly organized CF2 groups with minimum hindrance to molecular vibration modes in CVD grown films. Absorption bands at 1660 and 3389 cmâ1 show O and OH groups in the films which diminish on annealing. The C(1s) components, CF3, CF and C-CF bonding show branching, cross-liking and defects sites which increase as substrate temperature is increased. The O(1s) line analysis shows O2 in fluorocarbon films is chemically bonded as C-O and F2CO with relative ratio depending on the film growth temperature. Both O2 and OH are the result of additional reaction pathways involving the species generated from fragmentation of CF3C(O)F. Molecular structure of fluorocarbon polymer films involving these species are discussed which are in conformity with the XPS and IR absorption data.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Polymer - Volume 46, Issue 10, 25 April 2005, Pages 3440-3451
Journal: Polymer - Volume 46, Issue 10, 25 April 2005, Pages 3440-3451
نویسندگان
A.C. Rastogi, S.B. Desu,