Pattern formation by dewetting of polymer thin film

Strategies for the utilization of dewetting of polymer thin film to fabricate ordered patterns are reviewed. After a brief introduction to the polymer thin film dewetting theory, simulation results of pattern formation induced by physically and chemically patterned substrates, and physical confinement are then summarized. Experimental results including the mechanisms behind and the conditions for good quality of pattern formation based on the dewetting of polymer thin film induced by physical, chemical heterogeneous substrates, topographic structure on film surface, physical confinement and the movement of three-phase line are then discussed. A short introduction to the application of fabricated patterns is also discussed.