کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5349779 1503646 2014 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Use of n-type semiconductor silicon as substrate material for electrodeposition of Zn1−xFex alloy thin films
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Use of n-type semiconductor silicon as substrate material for electrodeposition of Zn1−xFex alloy thin films
چکیده انگلیسی
Zn1−xFex alloys were electrochemically deposited on semiconductor silicon substrates from sulfate bath. Effect of bath composition on phase formation, chemical composition, crystallite shape, electrical resistivity and magnetoresistance were investigated using appropriate characterization tools. It was shown that Zn-Fe alloys can be successfully deposited directly on semiconductor silicon substrate using electrodeposition technique. Iron content in films influences crystallite size, resistivity and magnetoresistance of films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 318, 1 November 2014, Pages 305-308
نویسندگان
, , , , ,