Electrical characterization of FIB processed metal layers for reliable conductive-AFM on ZnO microstructures

- Contact resistance between conductive AFM tip and different metals is investigated.
- FIB processed Ti and Cr areas have larger resistance than as deposited films.
- Gold displays low and ohmic tip-sample resistance even after FIB processing.
- Au/Ti stack on top of ZnO pillars allows reliable I-V characterization by C-AFM.