کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5357460 | 1503608 | 2015 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of surface non-stoichiometry on the electronic structure of ultrathin NiO(0Â 0Â 1) film
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effects of surface non-stoichiometry on the electronic structure of ultrathin NiO(0Â 0Â 1) film Effects of surface non-stoichiometry on the electronic structure of ultrathin NiO(0Â 0Â 1) film](/preview/png/5357460.png)
چکیده انگلیسی
Surface structure and electronic structure of ultra thin NiO flms grown on Ag(0Â 0Â 1) substrate have been investigated in detail by means of low energy electron diffraction and photoemission spectroscopic studies under systematic modifications of surface Ni to O stoichiometry. Mild Ar+ bombardments (300Â eV) were applied to the oxide films to produce predominant surface oxygen vacancies. These vacancy defects, which are mostly localized to the near surface region of the film, produce 'defect states' within the forbidden energy gap which pin the Fermi level (EF) away from valence band maxima. Angle-dependent X-ray photoemission spectroscopic studies have been undertaken to characterize the core level as well as the valence band electronic structures of the film which confirm the existence of metallic nickel clusters at the sputtered surface. The depletion of oxygen at the NiO surface produced by annealing in ultra high vacuum at sufficient temperature and its enhanced effect on the monolayer NiO film have been elucidated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 359, 30 December 2015, Pages 61-67
Journal: Applied Surface Science - Volume 359, 30 December 2015, Pages 61-67
نویسندگان
Jayanta Das, Krishnakumar S.R. Menon,