کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5360127 | 1503687 | 2013 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Synchrotron radiation photoemission study of the thermal annealing and atomic hydrogen cleaning of native oxide covered InAs(1Â 0Â 0) surfaces
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Changes induced in the surface chemical composition of native oxide covered InAs(1 0 0) by both thermal annealing and atomic hydrogen cleaning have been investigated by soft X-ray photoemission spectroscopy. Annealing up to 450 °C shows a reduction in the intensity of the In and As oxides, however this anneal is not sufficient to produce an oxide and carbon free surface. Exposure to a beam of atomic hydrogen at 360 °C results in the removal of both native oxides and surface carbon contamination resulting in a clean In rich surface. The chemical stability of the cleaned InAs surface to prolonged atomic hydrogen exposure times at temperatures up to 420 °C has also been investigated and shown to have no effect on the surface stoichiometry.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 276, 1 July 2013, Pages 609-612
Journal: Applied Surface Science - Volume 276, 1 July 2013, Pages 609-612
نویسندگان
Rajesh Kumar Chellappan, Zheshen Li, Greg Hughes,