Effects of the substrate temperature on the bioglass films deposited by pulsed laser

Effects of the substrate temperature on the bonding configuration and adhesion strength of the bioglass films deposited by pulsed laser were investigated by Fourier transform infrared spectroscopy (FTIR) and scratch apparatus. Morphology of the films is compact with the particles on the surface of them and the structure is amorphous glass. Bonding configuration is different from that of the target. Si-O-NBO/Si-O-Si (s) intensity ratios of the films decline as compared with the target. Besides, this tendency is obvious as the substrate temperature decreases. This effect is attributed to the network rearrangement during the film growth, which is associated to special structure of glass and complex physical mechanisms of pulsed laser deposition (PLD). Scratch test results show that the film deposited at 200 °C has the highest adhesion strength.