Effect of fabrication parameters on morphological and optical properties of highly doped p-porous silicon

► The porosity of the PS layers becomes more when applied current density (J) is increased. ► The layer thickness in 25% and 20% HF is in the micrometer range and it improves with increasing time. ► Decline in [HF] causes a decrease in the roughness of the surface and mean height of the layer. ► The rms roughness of OPS is less than 0.87 nm, shows a smooth and uniform surface after oxidation. ► R in sample with higher [HF] is more. In similar samples, higher J causes greater R in visible range.