کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5363956 | 1388308 | 2008 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Removal of scratch on the surface of MgO single crystal substrate in chemical mechanical polishing process
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Removal of scratch on the surface of MgO single crystal substrate in chemical mechanical polishing process Removal of scratch on the surface of MgO single crystal substrate in chemical mechanical polishing process](/preview/png/5363956.png)
چکیده انگلیسی
Etching and chemical mechanical polishing (CMP) experiments of the MgO single crystal substrate with an artificial scratch on its surface are respectively performed with the developed polishing slurry mainly containing 2Â vol.% phosphoric acid (H3PO4) and 10-20Â nm colloidal silica particles, through observing the variations of the scratch topography on the substrate surface in experiments process, the mechanism and effect of removing scratch during etching and polishing are studied, some evaluating indexes for effect of removing scratch are presented. Finally, chemical mechanical polishing experiments of the MgO substrates after lapped are conducted by using different kinds of polishing pads, and influences of the polishing pad hardness on removal of the scratches on the MgO substrate surface are discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 254, Issue 15, 30 May 2008, Pages 4856-4863
Journal: Applied Surface Science - Volume 254, Issue 15, 30 May 2008, Pages 4856-4863
نویسندگان
R.K. Kang, K. Wang, J. Wang, D.M. Guo,