کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5364730 | 1388319 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
FexNi100âx nanometric films deposited by laser ablation on SiO2/Si substrates
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
FexNi100âx nanometric films were deposited on SiO2/Si substrates at room temperature using the pulsed laser deposition technique. The targets were Fe-Ni amorphous magnetic foils with composition Fe50Ni50, Fe35Ni65 and Fe22Ni78. Morphological and structural properties of the deposited films were investigated using scanning electron microscopy, Rutherford backscattering spectrometry, grazing incidence X-ray diffraction, and X-ray reflectivity. Electrical and magnetic characteristics of the films were investigated by using the four-point probe and the magneto-optic Kerr effect techniques, respectively. The film properties are strictly dependent on the Fe-Ni compositional ratio.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 253, Issue 15, 30 May 2007, Pages 6522-6526
Journal: Applied Surface Science - Volume 253, Issue 15, 30 May 2007, Pages 6522-6526
نویسندگان
D. Berling, A.P. Caricato, E. Denys, M. Fernández, G. Leggieri, S. Luby, A. Luches, M. Martino, P. Mengucci,