کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5364843 1388321 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of oxygen plasma treatment on boron carbon nitride film composition
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Influence of oxygen plasma treatment on boron carbon nitride film composition
چکیده انگلیسی

Variations in the composition and bonds of boron carbon nitride (BCN) film caused due to an oxygen (O2) plasma ashing process are investigated for a low dielectric constant (low-k) insulating film for next generation LSI devices. The O2 plasma treatment is preformed for BCN samples with various C compositions. The etching rate of BCN films with an O2 plasma decreases with increasing C composition. The reaction of O atoms is suppressed in the BCN film with a high C composition. B-N and B-C bonds with lower bond energies are easily broken by the O2 plasma and replaced by the generation of B-O, N-O, and C-O bonds. The B-atom concentration for all samples is decreased significantly by the O2 plasma treatment. Ion bombardment may play a more dominant role than the O-atom reaction in the etching of the BCN film. The existence of C-N bonds with a high bonding energy may suppress etching and incorporation of O atoms.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 255, Issue 6, 1 January 2009, Pages 3635-3638
نویسندگان
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