کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5368822 1388410 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Molecular depth profiling of multi-layer systems with cluster ion sources
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Molecular depth profiling of multi-layer systems with cluster ion sources
چکیده انگلیسی

Cluster bombardment of molecular films has created new opportunities for SIMS research. To more quantitatively examine the interaction of cluster beams with organic materials, we have developed a reproducible platform consisting of a well-defined sugar film (trehalose) doped with peptides. Molecular depth profiles have been acquired with these systems using C60+ bombardment. In this study, we utilize this platform to determine the feasibility of examining buried interfaces for multi-layer systems. Using C60+ at 20 keV, several systems have been tested including Al/trehalose/Si, Al/trehalose/Al/Si, Ag/trehalose/Si and ice/trehalose/Si. The results show that there can be interactions between the layers during the bombardment process that prevent a simple interpretation of the depth profile. We find so far that the best results are obtained when the mass of the overlayer atoms is less than or nearly equal to the mass of the atoms in buried molecules. In general, these observations suggest that C60+ bombardment can be successfully applied to interface characterization of multi-layer systems if the systems are carefully chosen.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 252, Issue 19, 30 July 2006, Pages 6498-6501
نویسندگان
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