کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5369151 | 1388423 | 2009 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Generation of a stable surface concentration of amino groups on silica coated onto titanium substrates by the plasma enhanced chemical vapour deposition method Generation of a stable surface concentration of amino groups on silica coated onto titanium substrates by the plasma enhanced chemical vapour deposition method](/preview/png/5369151.png)
This report describes the amino functionalisation of the surface of plasma enhanced chemically vapour deposited silica films (PECVD-SiO2), which were coated onto titanium substrates. Amino groups were linked to PECVD-SiO2 via 3-aminpropyl triethoxysilane (APTES). We showed that the APTES functionalised PECVD-SiO2 surfaces contained a high packing density of amino groups (67-92 NH2 groups per nm2), indicative of a multilayered and highly cross-linked APTES film. 65-66% of the original surface concentration of APTES was retained on the PECVD-SiO2 surface after incubation under physiological conditions, indicating that APTES films are relatively stable on PECVD-SiO2 in these environments. The stability of the amino groups obtained on PECVD-SiO2 in this study is much higher compared to other hydroxyl-bearing materials, such as titanium. Therefore, PECVD-SiO2 films may find use as functional biomaterial coatings and as intermediate adhesion layers in silanisation processes.
Journal: Applied Surface Science - Volume 255, Issue 15, 15 May 2009, Pages 6846-6850