کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5369418 | 1388433 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Surface modification of Sylgard 184 polydimethylsiloxane by 254Â nm excimer radiation and characterization by contact angle goniometry, infrared spectroscopy, atomic force and scanning electron microscopy
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Surface modification of Sylgard 184 polydimethylsiloxane by 254Â nm excimer radiation and characterization by contact angle goniometry, infrared spectroscopy, atomic force and scanning electron microscopy Surface modification of Sylgard 184 polydimethylsiloxane by 254Â nm excimer radiation and characterization by contact angle goniometry, infrared spectroscopy, atomic force and scanning electron microscopy](/preview/png/5369418.png)
چکیده انگلیسی
The modification of polydimethylsiloxane (PDMS) by narrow band 254 nm excimer radiation under a nitrogen atmosphere was characterized by contact angle goniometry, attenuated total reflectance infrared spectroscopy, atomic force and scanning electron microscopy. UV irradiation results in the formation of the carboxylic acids that influences the wettability of the surface. Continued exposure results in the formation of an inorganic surface (SiOx (1 < x < 2)) which hinders the ability to continually increase the wettability. The continuity of this inorganic layer is disrupted by the formation of surface cracks. These results have implications in the fabrication and chemical modification of microfluidic or micro-electro-mechanical systems.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 254, Issue 17, 30 June 2008, Pages 5314-5318
Journal: Applied Surface Science - Volume 254, Issue 17, 30 June 2008, Pages 5314-5318
نویسندگان
Emanuel A. Waddell, Stephen Shreeves, Holly Carrell, Christopher Perry, Branden A. Reid, James McKee,