Morphology and thermal stability of AlF3 thin films grown on Cu(100)

► Study of the thermal stability and morphology of epitaxial AlF3 films on Cu(100). ► AlF3 decomposes upon low-energy electron irradiation. ► Thin films (1-2 ML) rearrange and dewet the substrate upon mild annealing (T < 500 K). ► Thicker films are stable up to ca. 760 K.