کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
542368 | 871548 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Titanium nitride electrodes for micro-gap discharge
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Titanium and titanium nitride (TiN) were used as thin film electrodes for a micro-gap discharge device. The titanium electrodes were fabricated by sputter deposition of pure titanium accompanied with a lift-off process. The TiN electrodes were prepared by nitriding the titanium electrodes with nitrogen plasma. Gas discharges between the electrodes at various argon pressures were characterized and their breakdown voltages were compared. Both the titanium and TiN electrodes have a minimum breakdown voltage about 220 V at a pressure spacing product (P·d) of 0.8 mbar·cm. The nitrided electrodes were more durable than the as-deposited titanium electrodes upon a DC discharge for 5 s or 200 cycles of electrostatic discharge.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Journal - Volume 37, Issue 9, September 2006, Pages 867–870
Journal: Microelectronics Journal - Volume 37, Issue 9, September 2006, Pages 867–870
نویسندگان
Chung-Fon Hsieh, Shyankay Jou,