کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5424792 | 1395836 | 2007 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The molecular orientation of DNA bases on H-passivated Si(1Â 1Â 1) surfaces investigated by means of near edge X-ray absorption fine structure spectroscopy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: The molecular orientation of DNA bases on H-passivated Si(1Â 1Â 1) surfaces investigated by means of near edge X-ray absorption fine structure spectroscopy The molecular orientation of DNA bases on H-passivated Si(1Â 1Â 1) surfaces investigated by means of near edge X-ray absorption fine structure spectroscopy](/preview/png/5424792.png)
چکیده انگلیسی
Layers of the DNA bases adenine, cytosine, and guanine were deposited onto hydrogen passivated Si(1Â 1Â 1) surfaces. The average tilt angles of these molecules with respect to the substrate surface were determined by the angular dependence of the Near Edge X-ray Absorption Fine Structure (NEXAFS) of the carbon K-edge. The interpretation of the NEXAFS spectra was assisted by a semi-empirical approach to the calculation of the Ïâ-transition region which employs density functional theory calculations and core level photoemission data.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 601, Issue 11, 1 June 2007, Pages 2291-2296
Journal: Surface Science - Volume 601, Issue 11, 1 June 2007, Pages 2291-2296
نویسندگان
Stefan Seifert, Gianina N. Gavrila, Dietrich R.T. Zahn, Walter Braun,