Effect of deposition parameters on properties of TiO2 films deposited by reactive magnetron sputtering

TiO2 films were grown onto unheated 5083 aluminum alloy substrates by reactive magnetron sputtering from a pure Ti target in Ar-O2 gas mixture in different power, bias voltage, Ar/O2 ratio and deposition time at room temperature. The effects of different deposition parameters on the structure and properties of TiO2 films were investigated systematically by field emission scanning electron microscope (FESEM), atomic force microscope (AFM), X-ray diffractometer (XRD), X-ray photoelectron spectroscopy (XPS), nanoindentation tests, electrochemical tests and antibacterial tests. The results show that power and bias voltage are two main factors to affect the structure and properties of TiO2 films during the sputtering process. XRD results show that anatase phase is the main phase of the film, and the enhanced content of anatase phase with the increase of sputtering power and bias voltage. Nanoindentation tests exhibit that higher H/E (Hardness/Modulus) ratio can be achieved by depositing TiO2 film. And the corrosion resistance and antifouling property are all improved after depositing TiO2 film. 2# sample shows the optimal corrosion resistance, Ecorr and Icorr are −0.27388 V and 3.7232 μA/cm2, respectively. 1# sample exhibits excellent antibacterial property, the d ensity of bacteria is only 217 cell / mm2, which is 484% higher than that of uncoated matrix.