کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5456083 | 1514660 | 2017 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evaluation of nanoindentation and nanoscratch characteristics of GaN/InGaN epilayers
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Evaluation of nanoindentation and nanoscratch characteristics of GaN/InGaN epilayers Evaluation of nanoindentation and nanoscratch characteristics of GaN/InGaN epilayers](/preview/png/5456083.png)
چکیده انگلیسی
The potential use of thin films in many engineering applications has prompted the mechanical characterization of small volumes, such as thin films or micro-sized phases to receive considerable attention. In this study, nanoindentation-induced mechanical deformation behavior of the GaN/InGaN Multiple quantum well structure (MQW) grown on (0001) sapphire was investigated using Berkovich and cube corner indenters. A single discontinuity ('pop-in') in the load-indentation depth curve was observed for the films, the physical mechanism being the interaction of the deformed regions produced by the indenter. The nanoscratch technique, a versatile approach to evaluate the nanotribological properties of thin films was employed to study the elastic and plastic behavior of the sample. The Atomic force microscopy (AFM) was helpful to reveal the deformation morphologies and scratch profiles. Analysis of the residual indentation impression revealed pile-up and sink-in behavior related to the plasticity of the samples.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 683, 23 January 2017, Pages 64-69
Journal: Materials Science and Engineering: A - Volume 683, 23 January 2017, Pages 64-69
نویسندگان
D. Geetha, P. Joice Sophia, R. Radhika, D. Arivuoli,