Comparison of resistive switching characteristics by using e-gun/sputter deposited SiOx film in W/SiOx/TiN structure and pH/creatinine sensing through iridium electrode

Comparison of resistive switching characteristics by using e-gun/sputter deposited SiOx film in W/SiOx/TiN structure and pH/creatinine sensing through iridium electrode

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 726, 5 December 2017, Pages 30-40

Sourav Roy, Anisha Roy, Rajeswar Panja, Subhranu Samanta, Somsubhra Chakrabarti, Po-Lin Yu, Siddheswar Maikap, Hsin-Ming Cheng, Ling-Na Tsai, Jian-Tai Qiu,