Self-assembled c-axis oriented δ-MoN thin films on Si substrates by chemical solution deposition: Growth, transport and superconducting properties

Molybdenum nitrides Mo-N are considered as the hardest superconducting metal nitrides, which are usually prepared under high pressure and high temperature to obtain high superconducting transition temperature Tc. Here, polycrystalline δ-MoN thin films with self-assembled c-axis orientation are directly deposited onto Si substrates by chemical solution deposition under ambient NH3 annealing atmosphere without high pressure processing. The prepared δ-MoN/Si thin films show Tc higher than 12 K. The normal state resistivity obeys electron-phonon scattering mechanism and can be well fitted by Bloch-Grüneisen expression. The results will provide an effective route to prepare large-area δ-MoN/Si thin films with high Tc as well as a guidance to investigate the fundamental properties of polycrystalline δ-MoN thin films.