کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5460789 | 1516196 | 2017 | 25 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy](/preview/png/5460789.png)
چکیده انگلیسی
High-resolution x-ray photoelectron spectroscopy (XPS) was employed to characterize the energy band alignment between TiO2/multilayer (ML)-MoS2. The TiO2 film and ML-MoS2 film was grown by an atomic layer deposition (ALD) and chemical vapor deposition (CVD), respectively. The effect of CHF3 plasma treatment on the band alignment between TiO2/ML-MoS2 was evaluated. It was found that the valence band offset (VBO) and a conduction band offset (CBO) of TiO2/ML-MoS2 interface was changed from 2.28Â eV to 2.51Â eV, and from 0.28Â eV to 0.51Â eV, respectively for the sample with CHF3 plasma treatment. With the CHF3 plasma treatment, the down-shift of Mo 3d core level binding energy results in a bend-up of energy potential on the MoS2 side, leading to 0.23Â eV ÎEC difference between the control and the sample with CHF3 plasma treatment, which is caused by the interfacial layer in rich of F element. The physics details of the band alignment at TiO2/ML-MoS2 interface will provide a guide for the MoS2 based electronic device design.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 698, 25 March 2017, Pages 141-146
Journal: Journal of Alloys and Compounds - Volume 698, 25 March 2017, Pages 141-146
نویسندگان
Xinke Liu, Le Chen, Qiang Liu, Jiazhu He, Kuilong Li, Wenjie Yu, Jin-Ping Ao, Kah-Wee Ang,