کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5489181 | 1524352 | 2017 | 22 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Molecular beam epitaxy and characterization of high Bi content GaSbBi alloys
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Molecular beam epitaxy and characterization of high Bi content GaSbBi alloys Molecular beam epitaxy and characterization of high Bi content GaSbBi alloys](/preview/png/5489181.png)
چکیده انگلیسی
The epitaxial growth, structural and optical properties of GaSb1âxBix layers are reported. The incorporation of Bi into GaSb is varied in the 0 < x ⩽ 14% range by varying the growth temperature and V:III BEP ratio. The Bi content and the structural properties were determined by Rutherford backscattering and X-ray diffraction, respectively. The optical properties have been studied by photoluminescence (PL) spectroscopy. The surface morphology was observed by optical and atomic force microscopies. The samples show a smooth, droplet free surface up to 11.4% Bi incorporation. All samples exhibit room temperature PL up to a wavelength of 3.8 μm achieved for 14% Bi incorporation. Finally, these alloys have shown a great thermal stability after several annealing at 450 °C. This work thus presents the highest Bi-content GaSbBi alloys and the first demonstration of room-temperature PL emission from GaSbBi alloys.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 477, 1 November 2017, Pages 144-148
Journal: Journal of Crystal Growth - Volume 477, 1 November 2017, Pages 144-148
نویسندگان
O. Delorme, L. Cerutti, E. Tournié, J.-B. Rodriguez,