کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5489434 | 1524365 | 2017 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Measurement of 3-dimensional dopant distribution in InGaAs microdiscs grown selectively on Si (111)
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
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چکیده انگلیسی
The control of the dopant profile in 3-dimentional InGaAs microdiscs on Si (111) is essential for their device applications. However, such profiles can never be controlled by simply changing the supply of dopant precursors during the growth of microdiscs. This is because a variety of crystal planes, such as (111), {â110}, and irregular planes near the corners, surround a hexagonal pillar of InGaAs and the incorporation efficiency of dopant elements depends significantly on the kind of planes involved. We here observed the distributions of sulfur and zinc in p-i-n InGaAs microdiscs by both cross-sectional scanning capacitance microscopy (SCM) and secondary-ion mass spectrometry using focused ion beam (NanoSIMS). Even though the InGaAs shell was grown on the microdiscs using dimethylzinc (DMZn), no p-type region was found on the top of the microdiscs and the p-type region existed on the sidewall of the discs alone. This result suggested that the zinc incorporation efficiency on InGaAs (111) plane is much lower than that on {â110} planes. Complete encapsulation of the microdiscs with p-type region was possible by the post-diffusion of zinc during exposure to a mixture of tertiarybutylarsine (TBAs) and DMZn after the growth of InGaAs microdiscs.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 464, 15 April 2017, Pages 33-38
Journal: Journal of Crystal Growth - Volume 464, 15 April 2017, Pages 33-38
نویسندگان
Tohma Watanabe, Miyuki Takeuchi, Yoshiaki Nakano, Masakazu Sugiyama,