Inter- and intra-nanowire magnetic interaction in Co/Cu multilayer nanowires deposited by electrochemical deposition

Intra- and inter-wire magnetic interactions in Co/Cu multilayer nanowire arrays have been studied with the Henkel plot method. It has been found that the intra-nanowire interaction greatly decreases with an increase in the Cu spacer thickness. Magnetoresistance of 0.16% has been obtained in Co(200 nm)/Cu(5 nm)/Co(10 nm) junction. However, the magnetoresistance effect is negligible both in the juctions with strong intra-nanowire interaction ( thickness of Cu spacer is less than 3 nm) and the juctions with strong current-depolarization (thickness of Cu spacer is more than 17 nm).