Analysis of trihalomethane precursor removal from sub-tropical reservoir waters by a magnetic ion exchange resin using a combined method of chloride concentration variation and surrogate organic molecules

- Hydrophobic acid was 75% of DOM in the reservoir waters in tropical islands.
- Hydrophilic acid had the highest specific THMFP among three DOM fractions.
- Surrogate DOM and a high chloride dose were used to find the DOM removal mechanisms.
- Hydrophobic acid was removed by multiple mechanisms and was unaffected by chloride.
- Hydrophilic acid was removed by ion exchange; thus, it was affected by chloride.

In small reservoirs in tropical islands in Japan, the disinfection by-product formation potential is high due to elevated concentrations of dissolved organic matter (DOM) and bromide. We employed a combined method of variation of chloride concentrations and the use of DOM surrogates to investigate removal mechanisms of bromide and different fractions of DOM by chloride-based magnetic ion exchange (MIEX®) resin. The DOM in reservoir waters was fractionated by resins based on their hydrophobicity, and characterized by size-exclusion chromatography and fluorescence excitation-emission matrix spectrophotometry. The hydrophobic acid (HPO acid) fraction was found to be the largest contributor of the trihalomethane (THM) precursors, while hydrophilic acid (HPI acid) was the most reactive precursors of all the four THM species. Bromide and DOM with a molecular weight (MW) greater than 1 kDa, representing HPO acid (MW 1-3 kDa) and HPI acid (MW 1-2 kDa), were effectively removed by MIEX® resin; however, DOM with a MW lower than 1 kDa, representing HPI non-acid, was only moderately removed. The removal of THM precursors by MIEX® resin was interfered by high chloride concentrations, which was similar to the removal of glutamic acid (HPI acid surrogate) and bromide. However, elevated chloride concentrations had only a minor effect on tannic acid (HPO acid surrogate) removal, indicating that HPO acid fraction was removed by a combination of ion exchange and physical adsorption on MIEX® resin. Our study demonstrated that the combined use of DOM surrogates and elevated chloride concentrations is an effective method to estimate the removal mechanisms of various DOM fractions by MIEX® resin.

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