کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
662356 | 1458164 | 2007 | 15 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A lamp thermoelectricity based integrated bake/chill system for photoresist processing
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
جریان سیال و فرایندهای انتقال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The design of an integrated bake/chill module for photoresist processing in microlithography is presented, with an emphasis on the substrate spatial and temporal temperature uniformity. The system consists of multiple radiant heating zones for heating the substrate, coupled with an array of thermoelectric devices which provide real-time dynamic and spatial control of the substrate temperature. The integration of the bake and chill steps eliminates the loss of temperature control encountered during the mechanical transfer from the bake to chill step. The feasibility of the proposed approach is demonstrated via detailed modeling and simulations based on first principle heat transfer analysis.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Heat and Mass Transfer - Volume 50, Issues 3â4, February 2007, Pages 580-594
Journal: International Journal of Heat and Mass Transfer - Volume 50, Issues 3â4, February 2007, Pages 580-594
نویسندگان
Arthur Tay, Hui Tong Chua, Xiaodong Wu,