کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6744507 | 1429328 | 2017 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Synthesis of Cr2AlC thin films by reactive magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
مهندسی انرژی و فناوری های برق
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Synthesis of Cr2AlC thin films by reactive magnetron sputtering Synthesis of Cr2AlC thin films by reactive magnetron sputtering](/preview/png/6744507.png)
چکیده انگلیسی
Cr2AlC thin films are deposited on MgO (100) and Al2O3 (0001) substrates with reactive radio frequency (RF) magnetron sputtering for the first time. Single phase Cr2AlC films are synthesized at a substrate temperature of 480 °C and deposition power of 70W, with a preferred orientation. The film is polycrystalline with a dense microstructure. The preferred orientation disappears and AlCr2 impurity emerges as the temperature and sputtering power rise during the deposition. When the sputtering power is 90 W or higher, the phase becomes totally AlCr2 due to C loss. The Cr2AlC phase is stable in vacuum for temperatures up to 700 °C, but the phase starts to decompose into Cr7C3 at 800 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Fusion Engineering and Design - Volume 125, December 2017, Pages 562-566
Journal: Fusion Engineering and Design - Volume 125, December 2017, Pages 562-566
نویسندگان
Ranran Su, Hongliang Zhang, Xiangpeng Meng, Liqun Shi, Chaozhuo Liu,