کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
701174 1460818 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Deposition of DLC film from adamantane by using pulsed discharge plasma CVD
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Deposition of DLC film from adamantane by using pulsed discharge plasma CVD
چکیده انگلیسی

Diamond like carbon films are deposited on silicon and quartz substrates using adamantane as a sole source of carbon by pulsed discharge plasma chemical vapor deposition. Tauc band gap of such films has been successfully tuned from 1.7eV to 2.9eV. Iodine incorporation is observed to favor the growth of such films and induces disorder in the films. It also brings down in energy the on-set of photon absorption. Such iodine incorporated diamond like carbon films may be interesting candidates for the new coming applications such as for heterojunction photovoltaic devices.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 17, Issues 4–5, April–May 2008, Pages 684–687
نویسندگان
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