Atomic force microscopy observations of a single crystal diamond surface lifted-off via ion implantation

The microscopic surface morphology of “lifted-off” surfaces, produced via ion implantation was observed by atomic force microscopy. A polished single-crystal diamond substrate with an average surface roughness of less than 0.1 nm was used for precise observations. After the lift-off process, the lifted-off surface became rough with pits appearing. Hydrogen plasma treatment close to the chemical vapor deposition conditions for diamond (1150 °C, 160 Torr) completely removed these pits and the surface was subsequently covered by a strip-like structure consisting of atomic steps. The surface roughness, however, was not further influenced by the plasma treatment. The observed morphological evolution reflects the graphite/diamond interface formed by the lift-off.

► Ion implantation lift-off was performed on highly polished single crystal diamond.
► Microscopic surface morphology of the lift-off surface was observed by AFM.
► Pits were observed on the lifted-off surface and can be completely removed by hydrogen plasma treatment.
► The surface roughening by the ion implantation lift-off process was confirmed.