کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
702427 1460806 2012 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Analysis of dissociative excitation reactions of CH3CN with the ECR plasmas of Ar and He
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Analysis of dissociative excitation reactions of CH3CN with the ECR plasmas of Ar and He
چکیده انگلیسی

The dissociative excitation reactions of CH3CN with the electron-cyclotron resonance (ECR) plasma flows of Ar and He were studied based on the electrostatic-probe measurements and on the optical emission spectra of the CN(B2Σ+ − X2Σ+) transition. The density and the temperature of free electrons and the CN(B2Σ+ − X2Σ+) emission intensity in these plasmas are varied by adding a trace amount of H2O. From the correlation between the CN(B2Σ+ − X2Σ+) emission intensity and the electron density contributing to the dissociation process upon the addition of H2O, the formation of the CN(B2Σ+) state from the decomposition of CH3CN proceeds, predominantly, via the electron impact in the Ar plasma and via the electron impact and/or the ion–electron recombination in the He plasma. These results are found to be consistent with the evaluation of the number densities of CN(B2Σ+) using the steady-state method. In addition, hydrogenated amorphous carbon nitride films were prepared under the desiccated condition, and the compositional analysis was carried out, yielding the [N]/([N] + [C]) ratio of 0.22 and 0.25 for the Ar and He plasmas, respectively.


► The mechanism of decomposition of CH3CN in the electron cyclotron resonance plasmas of Ar and He was elucidated.
► A trace amount of H2O vapor was introduced into the reaction system to compare the dependencies of the CN(B2Σ+ − X2Σ+) emission intensity and the density and the temperature of electrons.
► The decomposition was found to proceed via the impact of energetic electrons in the Ar plasma and via the electron impact and/or the ion–electron recombination in the He plasma.
► This reaction was applied to form hydrogenated amorphous carbon nitride films with [N]/([N] + [C]) = 0.22 and 0.25 for the Ar and He plasmas, respectively.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 24, April 2012, Pages 111–115
نویسندگان
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