Diamond-like carbon deposited by plasma technique as a function of methane flow rate

Diamond-like carbon (a-C:H) prepared by plasma enhanced chemical vapor deposition (PECVD) as a function of methane gas flow rate is reported. Films deposited at zero flow rate, i.e., without the use of vacuum pumps during the deposition, are also investigated. For that purpose, the reactor chamber was baked and pumped down to about 10−8 Torr to reduce contamination released from the reactor walls. The films were analyzed by visible, infrared and Raman spectroscopes. It was observed that the deposition rate, hydrogen concentration and optical gap depend on the methane gas flow rate. A maximum for deposition rate found at methane flow was much smaller than the flow usually adopted in conventional procedures.