کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
703181 | 891128 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Simulation of microwave plasmas concentrated on the top surface of a diamond substrate with finite thickness
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Steady states of microwave plasma discharges have been numerically studied for chemical vapor depositions of diamonds. In the present simulations, a diamond substrate with 1 mm thick and 5 × 5 mm2 areas is taken into account. It is found that distributions of plasma close to the substrate are modified by the presence of the substrate. By changing a depth of the substrate and a distance between edges of the substrate and the holder, profiles of the power density above the substrate can be varied into concave/convex distributions similar to experimentally observed surface morphologies. Clear correspondence between tendencies of these density distributions and experimentally observed surface morphologies is found.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 15, Issue 9, September 2006, Pages 1383–1388
Journal: Diamond and Related Materials - Volume 15, Issue 9, September 2006, Pages 1383–1388
نویسندگان
Hideaki Yamada, Akiyoshi Chayahara, Yoshiaki Mokuno, Yuji Horino, Shinichi Shikata,