Nanocrystalline diamond surface functionalization in radio frequency plasma

Here we present data on growth of thin nanocrystalline diamond (NCD) layers on silicon and glass substrates by microwave plasma-enhanced chemical vapor deposition. The typical NCD layer thickness is below 500 nm with a typical grain size about 50 nm. NCD films are optically transparent, have a smooth surface and a low background photoluminescence. We have applied a radio-frequency (RF) plasma discharge in vaporized silane coupling agent N-(6-aminohexyl) aminopropyl trimethoxysilane to successfully functionalize the NCD surface with the primary amino group NH2 as confirmed by using fluorescamine-in-acetone spray as a fluorescence marker.