کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
703497 1460817 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Synthesis of boron-doped homoepitaxial single crystal diamond by microwave plasma chemical vapor deposition
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Synthesis of boron-doped homoepitaxial single crystal diamond by microwave plasma chemical vapor deposition
چکیده انگلیسی

The deposition of boron-doped homoepitaxial single crystal diamond is investigated using a microwave plasma-assisted chemical vapor deposition system. The objective is to deposit high-quality boron-doped single crystal diamond and establish the relationships between the deposition conditions and the diamond growth rate and quality. Experiments are performed using type Ib HPHT diamond seeds as substrates and growing diamond with varying amounts of diborane in a methane–hydrogen gas mixture. The deposition system utilized is a 2.45 GHz microwave plasma-assisted CVD system operating at 135–160 Torr. Experiments are performed with methane concentrations of 4–6% and diborane concentrations of 5–50 ppm in the feedgas. Diamond is deposited with growth rates of 2 to 11 µm/h in this study. The deposited diamond is measured to determine its electrical conductivity and optical absorption versus wavelength in the UV, visible and IR portions of the spectrum. Data is presented that relates the growth rate and diamond properties to the deposition conditions including substrate temperature and feedgas composition.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 17, Issues 7–10, July–October 2008, Pages 1320–1323
نویسندگان
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