کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
703599 891144 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A 400 μm thickness diamond-like carbon preparation
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
A 400 μm thickness diamond-like carbon preparation
چکیده انگلیسی

A 400 μm thick diamond-like carbon (DLC) film was prepared on an aluminum alloy (A5052) substrate by a hybrid process of plasma-based ion implantation and deposition using toluene as a precursor gas. The plasma-based ion implantation during deposition relaxed the residual stress in DLC film to almost 0, indicating the production of stress-free DLC. The carbon ion implantation from the methane and acetylene plasmas to the substrate surface, prior to deposition, resulted in an interface graded in carbon composition as well as the formation of amorphous-like structure at the carbon ion-implanted layer that should work as a buffer for stress-relaxation. As a result, a supra-thick DLC film more than 400 μm in thickness was prepared on the substrate.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 17, Issue 3, March 2008, Pages 405–408
نویسندگان
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