کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
749294 894820 2008 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Enhancement of physical properties of indium tin oxide deposited by super density arc plasma ion plating by O2 plasma treatment
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Enhancement of physical properties of indium tin oxide deposited by super density arc plasma ion plating by O2 plasma treatment
چکیده انگلیسی

Indium tin oxide (ITO) films were deposited on glass by super density arc plasma ion plating (SDAP-IP) method. In X-ray diffraction profiles, no obvious changes were found after O2 plasma treatment. The transmittance, roughness, X-ray diffraction pattern, and sheet resistance also negligibly changed with O2 plasma treatment. However, the water contact angle decreased with the O2 plasma treatment, suggesting the increase of cohesive force between SDAP-IP ITO and organic materials. Synchrotron radiation photoemission spectroscopy showed that O2 plasma treatment resulted in an increase of SDAP-IP ITO work function. Incorporation of oxygen atoms near the SDAP-IP ITO surface during the O2 plasma treatment induced a peroxidic ITO surface, increasing the work function.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 52, Issue 1, January 2008, Pages 1–6
نویسندگان
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