کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
749647 | 894837 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of InP/InGaAs pnp δ-doped heterojunction bipolar transistor with extremely low offset voltage
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
In this paper, the characteristics and device mechanism of InP/InGaAs pnp δ-doped heterojunction bipolar transistor are demonstrated. The additions of a δ-doped sheet and two spacer layers efficiently eliminate the potential spike at emitter-base junction, lower the emitter-collector offset voltage, and increase the confinement effect for electrons, simultaneously. The components of base current and the influence of δ-doped sheet on the potential spike are depicted. Experimentally, excellent device performances including a maximum current gain of 50 and a low offset voltage of 70 mV are achieved for the device with a δ-doped density of 2 Ã 1012 cmâ2. The experimental results are consistent with the theoretical analysis.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 50, Issue 3, March 2006, Pages 468-472
Journal: Solid-State Electronics - Volume 50, Issue 3, March 2006, Pages 468-472
نویسندگان
Jung-Hui Tsai, Yu-Chi Kang, I-Hsuan Hsu, Tzu-Yen Weng,