کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
753000 | 1462264 | 2012 | 5 صفحه PDF | دانلود رایگان |

The study explored titanium dioxide (TiO2) on aluminum gallium arsenide (AlGaAs) prepared by liquid phase deposition (LPD) at 40 °C. The leakage current density was about 8.4 × 10−6 A/cm2 at 1 MV/cm. The interface trap density (Dit) and the flat-band voltage shift (ΔVFB) were 2.3 × 1012 cm−2 eV−1 and 1.2 V, respectively. After rapid thermal annealing (RTA) in the ambient N2 at 350 °C for 1 min, the leakage current density, Dit, and ΔVFB were improved to 2.4 × 10−6 A/cm2 at 1 MV/cm, 7.3 × 1011 cm−2 eV−1, and 1.0 V, respectively. Finally, the study demonstrates the application to the AlGaAs/InGaAs metal–oxide–semiconductor pseudomorphic high-electron-mobility transistor (MOS-PHEMT). The results indicate the potential of the proposed device with a LPD-TiO2 gate oxide for power application.
► The paper exhibits the possibility of the TiO2 on AlGaAs prepared by LPD.
► The properties of LPD-TiO2 can be improved after suitable thermal annealing.
► The subthreshold swing and the gate leakage current are improved for the MOS-PHEMT.
► The results indicate the potential of the MOS-PHEMT for power application.
Journal: Solid-State Electronics - Volume 68, February 2012, Pages 85–89