Solidly mounted BAW resonators with layer-transferred AlN using sacrificial Si surfaces

We present a new method to manufacture solidly mounted bulk acoustic wave resonators. This new process introduces the use of wafer bonding techniques and sacrificial surface removal to manufacture solidly mounted resonators having special properties. With the proposed process, Aluminum Nitride (AlN) thin films are obtained having exceptional c-axis crystal orientation with XRD rocking curve FWHM of 1.36° and material electromechanical coupling constant of 6.8% exceeding that of the epitaxial AlN electromechanical coupling constant. Fully functional single-mask resonators were successfully fabricated with this process working around 2.35 GHz and enjoying Q-values as high as 1300.