کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
753525 | 895544 | 2007 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Trapping in deep defects under substrate hot electron stress in TiN/Hf-silicate based gate stacks
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
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چکیده انگلیسی
Substrate hot electron stress was applied on n+-ringed n-channel MOS capacitors with TiN/Hf-silicate based gate stacks to study the role of O vacancy induced deep bulk defects in trapping and transport. For the incident carrier energies above the calculated O vacancy formation threshold, applied on MOS devices with the thick high-κ layer, both the flatband voltage shift due to electron trapping at the deep levels and the increase in leakage current during stress follow tn (n ≈ 0.4) power law dependence. Negative-U transitions to the deep levels are shown to be possibly responsible for the strong correlation observed between the slow transient trapping and the trap-assisted tunneling.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 51, Issue 1, January 2007, Pages 102–110
Journal: Solid-State Electronics - Volume 51, Issue 1, January 2007, Pages 102–110
نویسندگان
N.A. Chowdhury, P. Srinivasan, D. Misra,