Low voltage resistive memory devices based on graphene oxide-iron oxide hybrid

Low cost resistive switching memory devices using graphene oxide-iron oxide (GF) hybrid thin films, sandwiched between platinum (Pt) and indium-tin-oxide (ITO) electrodes, were demonstrated. The fabricated devices with Pt/GF/ITO structure exhibited reliable and reproducible bipolar resistive switching performance, with an ON/OFF current ratio of 5 × 103, excellent retention time longer than 105 s, SET voltage of 0.9 V, and good endurance properties. In all aspects of the device characteristics, the GF based devices outperformed graphene oxide (GO) based devices. Ohmic conduction was found to be dominant current conduction mechanism in all switching regions except for the high voltage regime where space charge limited conduction and trap charge limited conduction were found to be the main current conduction mechanism. X-ray photoelectron spectroscopy and transmission electron microscopy/selected area diffraction analysis revealed γ-Fe2O3 and Fe3O4 iron oxide phases coexist in the hybrid films. While the desorption/adsorption of oxygen-related functional groups on the GO sheets is the dominant resistive switching mechanism in Pt/GO/ITO devices, the formation/rupture of multiple highly conducting Fe3O4 filaments at the iron oxide/GO interface additionally facilitate the switching in the present Pt/GF/ITO devices. Thereby, excellent electrical switching performance was achieved.