کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7990395 | 1516127 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Ultrathin Ni-Mo oxide nanoflakes for high-performance supercapacitor electrodes
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
Supercapacitors based on nanomaterial electrodes exhibit great potential as power sources for advanced electronic devices. From a practical viewpoint, it is desirable to fabricate highly active and sustainable nanomaterial electrodes consisting of non-precious elements using a simple technique in a controllable way. In this work, we report the synthesis of a self-assembled ultra-thin porous nanoflake Ni-Mo oxide (NMO) film using the successive ionic layer adsorption and reaction (SILAR) technique. The nanoflake NMO thin film electrode with a large electrochemically active surface area of â¼108â¯cmâ2 exhibits a high specific capacitance of 1180 Fgâ1â¯at a current density of 1 Agâ1 and excellent rate capability, with a negligible capacity loss of 0.075% per cycle. Even at a high current rate of 10â¯Aâ¯gâ1 it retains a capacity of 600 Fgâ1. The highest energy and power densities obtained are 119 Whkgâ1 and 15.7â¯kWkgâ1, respectively. Electrochemical impedance spectroscopy analyses reveal that the electrode has considerably low charge transfer resistance. The observed excellent electrochemical energy storage performance of the nanoflake NMO electrode with a nanoporous surface is due to the synergetic effects of the large electrochemically active surface area, enhanced ion diffusion, and improved electrical conductivity.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 767, 30 October 2018, Pages 782-788
Journal: Journal of Alloys and Compounds - Volume 767, 30 October 2018, Pages 782-788
نویسندگان
Harish S. Chavan, Bo Hou, Abu Talha Aqueel Ahmed, Jongmin Kim, Yongcheol Jo, Sangeun Cho, Youngsin Park, Sambhaji M. Pawar, Akbar I. Inamdar, Seung Nam Cha, Hyungsang Kim, Hyunsik Im,