کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7993093 | 1516150 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
TiH2 and yttrium-doped TiH2 alloy films with different helium concentrations prepared by magnetron sputtering were investigated using ion beam analysis (IBA), X-ray diffraction (XRD), thermal helium desorption spectrometry (THDS), positron annihilation spectroscopy (PAS) and nanoindentation techniques. It was found that through increasing the concentration of doped Y atoms, strong release peaks of helium will be found at about 820â¯K. The release at 820â¯K corresponds to the binding energy of the helium state on grain boundary indicating that the majority of the helium exists in the grain boundaries. In addition, the results of XRD and nanoindentation indicate that the doping of Y in the TiH2 films can improve the hardness and the elastic modulus of the films because of the fine-grain strengthening caused by the decreased size of TiH2 grains.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 744, 5 May 2018, Pages 778-784
Journal: Journal of Alloys and Compounds - Volume 744, 5 May 2018, Pages 778-784
نویسندگان
Zhibin Han, Chunjie Wang, Guijun Cheng, Hongliang Zhang, Ranran Su, Yiming Duan, Jie Gao, Xiaojie Ni, Bangjiao Ye, Wei Zhang, Liqun Shi,